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High Precision Lithography Pattern
Up to 256 grayscale pattern
Minimum critical dimension down to 400 nm
Compatible with Various Substrates
Up to 200 mm x 200 mm
Silicon wafers, quartz wafers, and silica wafers, etc.
Multi-lens Motorized Switching
Compatible with a variety of application scenarios
High accuracy
High efficiency
High precision mode
High speed mode
User-friendly Operation Interface
Pattern preview, what you see is what you get
Green LED indication, UV exposure
and photoresist safe enclosure
Direct Project UV Photolithography
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