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Based on Spatial Light Modulation Technology

Flexible and Convenient Pattern Design

Maskless UV Lithography Series

High Precision Lithography Pattern

Up to 256 grayscale pattern

Minimum critical dimension down to 400 nm

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Compatible with Various Substrates

Up to 200 mm x 200 mm

Silicon wafers, quartz wafers, and silica wafers, etc.

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Multi-lens Motorized Switching

Compatible with a variety of application scenarios

High accuracy

High efficiency

High precision mode

 High speed mode

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User-friendly Operation Interface

Pattern preview, what you see is what you get

Green LED indication, UV exposure
and photoresist safe enclosure

Direct Project UV Photolithography

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